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Category
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Article
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Author
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Fujimura, Shuzo:K.Ishikawa:H.Ogawa
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Article Title
|
Contribution of interface roughness to the infrared spectra of thermally grown silicon dioxide films
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Institution
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Journal of Applied Physics
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Volume
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vol.85
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Number
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Page
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4076
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Date
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1999
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Abstract
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Notes
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URL
|
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Label
|
技術経営
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Register date
|
1999/12/31
|
