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Category
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Article
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Author
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Kikuchi J.:M. Nagasaka:S. Fujimura:H. Yano:Y. Horiike
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Article Title
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Cleaning of silicon surface by NF3-added hydrogen and water-vapor plasma downstream treatment
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Institution
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Japan Journal of Applied Physics
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Volume
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vol.35
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Number
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Page
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1022
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Date
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1996
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Abstract
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Notes
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URL
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Label
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技術経営
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Register date
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1996/12/31
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