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Category
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Article
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Author
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Kikuchi,J.:M. Iga:H. Ogawa:S. Fujimura:H. Yano
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Article Title
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Native oxide removal on Si surfaces by NF3-added hydrogen and water vapor plasma downstream treatment
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Institution
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Journal of Applied Physics
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Volume
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vol.33
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Number
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Page
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2207
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Date
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1994
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Abstract
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Notes
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URL
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Label
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技術経営
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Register date
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1994/12/31
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